Equipment |
year |
K€ |
Confocal optics, 10x objective |
2009 |
1 |
High-end dedicated lithography system for SEM |
2009 |
40 |
Edax Element Analysis, GENESIS APEX 2 Syst 60 for SEM with APOLLO XP SDD |
2009 |
63 |
Zeiss stereo Microscope Stand, SDA, free 360~ rotation |
2009 |
2 |
Biaxial Marciniak Stage, up to 150kN, GTD TU/e |
2009 |
40 |
Feritscope, Fischer Instruments |
2009 |
6 |
Nanomanipulators, Kleindiek nanotechnik Gmbh |
2009 |
70 |
Quanta 600F ESEM incl heating stages up to 1500C and Pt deposition |
2009 |
400 |
50 N Load cell, Kammrath/Weiss tensile stage |
2009 |
2 |
20 N Load cell, Kammrath/Weiss tensile stage |
2008 |
3 |
Plug-in’s and optics |
2008 |
15 |
Update AFM, Digital Instruments DI 3100 incl STM, MFM and HarmoniX |
2008 |
71 |
MicroIndenter with DMA and CMC, CSM instruments |
2008 |
77 |
Liquid Nitrogen Safe Fill system |
2008 |
7 |
Stereo Microscope V20, Zeiss |
2008 |
28 |
Nano-Indenter, Scanning, scratching/wear and high temp, Micro-Materials |
2008 |
3 |
Atomic Force & Scanning Tunneling Microscope, NanoSurf 2 |
2007 |
48 |
Clamping Kammrath/Weiss tensile stage/Climatebox |
2007 |
23 |
ScratchHead NanoIndenter |
2007 |
13 |
Gun Head UHR-SEM (FEI Sirion) |
2007 |
14 |
Nanotom CT Scanner |
2007 |
233 |
Cluster plus software Nanotom |
2007 |
48 |
Target system for automatic target preparation |
2006 |
75 |
Dual head confocal-laser interferometer |
2005 |
115 |
Polarization microscope |
2005 |
70 |
Kammrath + Weiss tensile stage |
2005 |
40 |
Submicron tensile stage |
2005 |
32 |
Olympus metaalmicroscoop |
2005 |
17 |
TDAS |
2005 |
16 |
Indentors |
2005 |
2 |
Thermal-mechanical microloading stage (Kammrath & Weiss), with 5000N and 500N load cells |
2004 |
96 |
Vacuum tube furnace (Carbolite HVT 12/60/700, 60 mm tube |
2004 |
65 |
Digital Image Correlation (DIC) system/software |
2004 |
55 |
AFM tips and holders |
2004 |
13 |
Scanning Electron Microscopy
UHR-SEM (FEI Sirion) equipped with OIM Pegasus, EDX (Edax) |
2003 |
490 |
Lateral Force Apparatus, GTD, TU/e, single asperity friction dynamics on micron scale |
2003 |
120 |
Nano-indenter XP with CSM, and DCM, MTS |
2002 |
184 |
Micro tensile stages, Deben Microtest 5 kN, load cells 5200 N; 2184 N; 690 N |
1999 |
150 |
Deben Microtest 2 kN, loadcells 2184 N; 690 N |
1999 |
15 |
Micro bending stage, Deben Microtest, load cells 1160 N; 2150 N |
1999 |
15 |
Stereo-microscopy, Zeiss Stemi 2000 |
1999 |
6 |
Philips XL 30 ESEM-FEG, equipped with GSE, SE, BSE detectors, EDX |
1998 |
680 |
Reflected light microscopy, Zeiss Axioplan 2 with AxioCam |
1998 |
68 |
Atomic Force Microscopy, Digital Instruments DI 3100 |
1998 |
150 |
Nano-indenter, GTD TU/e |
1997 |
95 |
Nano-indenter, GTD TU/e |
1994 |
50 |
